Erk
The Erk CPU Optimizer

Semiconductor Doping Lab

Pro Tip: Become a Doping Master!

Try different combinations of dopants to see how they affect performance. The optimal ratio between n-type (Phosphorus, Arsenic) and p-type (Boron) dopants is key! Each material has its own sweet spot. Earn achievements by experimenting with different materials and configurations!

Semiconductor Material
Select your magical semiconductor ingredient!
Silicon (Si)
The most common semiconductor material, forming the foundation of most modern electronics.

Bandgap

1.12 eV

Thermal Conductivity

150 W/(m·K)

Electron Mobility

1400 cm²/Vs

Hole Mobility

450 cm²/Vs

Common Dopants

N-Type
Phosphorus
Arsenic
Antimony
P-Type
Boron
Gallium
Indium

Common Applications

CPUs
Memory chips
Solar cells
Integrated circuits
Doping Controls
Mix your secret dopant formula (measured in parts per million)
P
Phosphorus
Adds electrons
1.00 ppm
MinMax
B
Boron
Creates holes
0.50 ppm
MinMax
As
Arsenic
Heavy electron donor
0.20 ppm
MinMax

Understanding Doping Concentrations

Doping concentrations are typically measured in parts per million (ppm) or atoms per cubic centimeter. Even tiny amounts of dopants dramatically change silicon's electrical properties.

Light Doping
(~0.01-10 ppm)Moderate Doping
(~10-500 ppm)Heavy Doping
(~500-2000 ppm)

Light Doping

Used for: Transistor channels, sensitive regions

Ratio: ~1 dopant per 100,000,000 silicon atoms

Moderate Doping

Used for: Wells, general purpose regions

Ratio: ~1 dopant per 1,000,000 silicon atoms

Heavy Doping

Used for: Contacts, source/drain regions

Ratio: ~1 dopant per 500,000 silicon atoms

Silicon Lattice Visualization
Watch the electrons dance through the crystal!
CPU Performance:
0 MIPS

Fun Fact!